Equipment - Fachbereich Physik an der RPTU

Workgroup Prof. Oesterschulze

Equipment

Following equipment is available in the working group and in the Nano+Structuring-Center (NSC) a cleanroom facility of the Technical University of Kaiserslautern:

Lithography:

Double Side Mask Aligner "EVG 620"

Advanced resist processing system "EVG 101"

"Raith e LINE"

with EDS

Subtractive Techniques:

(Reactive) ion beam etcher (IBE-RIBE) "Roth & Rau, IonSys 500"

Reactive ion etcher (ECR-RIE) "Roth & Rau MicroSys 350"

Wet etching lab

Additive Techniques:

Oxidation facility "PE0 630", ATV Technologie

PECVD Oxford PlamaLap 80

Electron beam evaporator "Pfeiffer Classics 500 L"

Parylene PVD-evaporator

REM DSM 960

Analytics:

Confocal Microscope WiTecAlpha- SNOM

4-point probe station for C-V and I-V measurements "Suss/Keithley"

Optical microscopes "Zeiss Axioskop 2 MAT" and image processing system

Surface profiler "Dektak 8", Veeco

AFM Dimension 3100 (Veeco)

Others:

Wire bonder "TPT HB12"

Substrate bonder "EVG 501"

Critical Point Dryer CPD 030

Sputter Machine Balzers Union CSD040

Bipotentiostat (Gramy)

Beam deflection system

Dicing saw "Disco DAD321"